Gentle ultrasound for sensitive substrates

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Sensitive components such as monocrystalline wafers from the photovoltaic and semiconductor industries, as well as optical lenses and prisms, place the highest demands on parts cleaning: Tiny contaminations must be removed gently and stably without impairing the surface. For these demanding cleaning tasks, Weber Ultrasonic has developed an intelligent ultrasonic system (Sonopower 3S Megasonic System) with frequencies from 500 to 1000 kHz. During operation, the generator has a number of features that enable the cleaning process to be gentle on the surface, while reliably removing contaminants. These include the combined frequency and amplitude modulation, which ensures homogeneous sound fields and prevents so-called standing waves. The Sonoscan automatically determines and sets the optimum working frequency and monitors and adjusts it during the process. This ensures that even under changing operating conditions, the ideal performance is always achieved. The adjustments are made during operation, which ensures uninterrupted operation.
Another special feature of the generator is the mains voltage management. Since it automatically compensates for voltage fluctuations, maximum process stability and operational reliability is guaranteed. The output can be regulated continuously in the range from 10 to 100 percent, which means that it can be adapted to the respective component in the best possible way. The optional Profinet interface integrated in the generator allows remote operation, whereby the ultrasonic-specific process parameters are precisely controlled and documented during cleaning. Optimally matched to the generator, new high-frequency oscillators enable an effective cavitation flow and thus efficient further processing of the clean components.

The complete article was published in German in the May/June issue of JOT.

Autor(en): Wi

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